{"id":88948,"date":"2025-02-24T10:53:54","date_gmt":"2025-02-24T02:53:54","guid":{"rendered":"https:\/\/solomon-3d.mesvr.tw\/?p=88948"},"modified":"2025-02-24T10:54:57","modified_gmt":"2025-02-24T02:54:57","slug":"ki-inspektionsloesung-fuer-halbleiterwafer-2","status":"publish","type":"post","link":"https:\/\/solomon-3d.mesvr.tw\/de\/anwenderberichte\/ki-inspektionsloesung-fuer-halbleiterwafer-2\/","title":{"rendered":"KI-Inspektionsl\u00f6sung f\u00fcr Halbleiterwafer"},"content":{"rendered":"<div class=\"post-title-custom-background wp-block-group alignfull has-white-color has-text-color has-link-color eplus-wrapper wp-elements-1\" style=\"margin-top:0;margin-bottom:0;padding-top:0;padding-right:0;padding-bottom:0;padding-left:0\"><div class=\"wp-block-group__inner-container is-layout-constrained wp-container-core-group-is-layout-3110c56b wp-block-group-is-layout-constrained\">\n<div class=\"wp-block-cover alignfull eplus-wrapper\" style=\"margin-top:0;margin-bottom:0;padding-top:var(--wp--preset--spacing--50);padding-right:var(--wp--preset--spacing--20);padding-bottom:var(--wp--preset--spacing--50);padding-left:var(--wp--preset--spacing--20);min-height:220px;aspect-ratio:unset;\"><span aria-hidden=\"true\" class=\"wp-block-cover__background has-black-background-color has-background-dim\"><\/span><img fetchpriority=\"high\" decoding=\"async\" width=\"795\" height=\"1200\" class=\"wp-block-cover__image-background wp-image-56257\" alt=\"black and white labeled box\" src=\"https:\/\/solomon-3d.mesvr.tw\/wp-content\/uploads\/rozwxefl27k.jpg\" data-object-fit=\"cover\" title=\"\" srcset=\"https:\/\/solomon-3d.mesvr.tw\/wp-content\/uploads\/rozwxefl27k.jpg 795w, https:\/\/solomon-3d.mesvr.tw\/wp-content\/uploads\/rozwxefl27k-199x300.jpg 199w, https:\/\/solomon-3d.mesvr.tw\/wp-content\/uploads\/rozwxefl27k-768x1159.jpg 768w\" sizes=\"(max-width: 795px) 100vw, 795px\" \/><div class=\"wp-block-cover__inner-container is-layout-flow wp-block-cover-is-layout-flow\">\n<h2 id=\"gspb_heading-id-gsbp-98a71402-b1a0\" class=\"gspb_heading gspb_heading-id-gsbp-98a71402-b1a0\">SolVision<span class=\"gspb_heading_subtitle\">Fallstudie<\/span><\/h2>\n\n\n\n<div class=\"case-category wp-block-columns has-white-color has-text-color eplus-wrapper is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column eplus-wrapper is-layout-flow wp-block-column-is-layout-flow\">\n<p class=\"has-text-align-center eplus-wrapper wp-block-paragraph\"><span style=\"\"><a href=\"https:\/\/solomon-3d.mesvr.tw\/de\/category\/case-studies\/semiconductors\/\" target=\"_blank\" rel=\"noreferrer noopener\">Halbleiter<\/a><\/span><\/p>\n<\/div>\n<\/div>\n<\/div><\/div>\n\n\n\n<div style=\"height:50px\" aria-hidden=\"true\" class=\"wp-block-spacer eplus-wrapper\"><\/div>\n\n\n<h1 class=\"has-text-align-center wp-block-post-title has-text-color has-black-color has-large-font-size\">KI-Inspektionsl\u00f6sung f\u00fcr Halbleiterwafer<\/h1><\/div><\/div>\n\n\n\n<h2 class=\"wp-block-heading has-text-align-center eplus-wrapper\" id=\"qualitatskontrolle-von-chemisch-mechanischen-polierprozessen-cmp\"><strong><strong>Qualit\u00e4tskontrolle von chemisch-mechanischen Polierprozessen (CMP)<\/strong><\/strong><\/h2>\n\n\n\n<div style=\"height:50px\" aria-hidden=\"true\" class=\"wp-block-spacer eplus-wrapper\"><\/div>\n\n\n\n<div class=\"wp-block-columns eplus-wrapper is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column eplus-wrapper is-layout-flow wp-block-column-is-layout-flow\">\n<h2 class=\"wp-block-heading eplus-wrapper\" id=\"cmp-und-wafer-oberflachen\"><strong>CMP und Wafer-Oberfl\u00e4chen<\/strong><\/h2>\n\n\n\n<p class=\"eplus-wrapper wp-block-paragraph\">Die <a href=\"https:\/\/de.wikipedia.org\/wiki\/Chemisch-mechanisches_Polieren\" target=\"_blank\" rel=\"noopener\">chemisch-mechanische Planarisierung (CMP)<\/a> ist ein unverzichtbarer Prozess in der Halbleiterfertigung, dessen Zweck darin besteht, kleine Defekte zu beheben, die in vorhergehenden Produktionsschritten entstanden sind. Jede Wafer-Schicht muss poliert und alle \u00fcbersch\u00fcssigen Materialien von ihrer Oberfl\u00e4che durch CMP entfernt werden, bevor die n\u00e4chste Schicht hergestellt werden kann. Allerdings k\u00f6nnen \u00fcberm\u00e4\u00dfig gro\u00dfe Partikel und Abrasionen aus der Schl\u00e4mme kleine Kratzer auf dem Wafer verursachen, die die h\u00e4ufigste Art von Defekten sind, die durch CMP-Prozesse entstehen.<\/p>\n<\/div>\n\n\n\n<div class=\"wp-block-column eplus-wrapper is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-large eplus-wrapper\"><img decoding=\"async\" src=\"\/wp-content\/uploads\/J001-1-800x396.png\" alt=\"Quality control of chemical mechanical polishing (CMP) processes\" title=\"\"><\/figure>\n<\/div>\n<\/div>\n\n\n\n<div class=\"wp-block-greenshift-blocks-titlebox gspb_titleBox gspb_titleBox-id-gsbp-d7f236a4-825c\" id=\"gspb_titleBox-id-gsbp-d7f236a4-825c\"><div class=\"gs-titlebox\"><div class=\"gs-title-inbox\"><div class=\"gs-titlebox-icon\"><\/div><div class=\"gs-title-inbox-label\"><\/div><\/div><div class=\"gs-titlebox-text\">\n<h2 class=\"wp-block-heading eplus-wrapper\" id=\"komplexe-hintergrunde-und-subtile-wafer-defekte\"><strong>Komplexe Hintergr\u00fcnde und subtile Wafer-Defekte<\/strong><\/h2>\n\n\n\n<p class=\"eplus-wrapper wp-block-paragraph\">Defekte, die durch CMP verursacht werden, umfassen in der Regel feine Kratzer, Partikelr\u00fcckst\u00e4nde und Ablagerungen von Polierpads. Nach dem Polieren erzeugt der Wafer extrem flache Polierstreifen, die einen komplexen Hintergrund in den Inspektionsbildern bilden. Da die Arten und Positionen der verschiedenen Defekte nicht festgelegt sind, k\u00f6nnen sie nicht leicht erkannt werden. Weitere h\u00e4ufige Oberfl\u00e4chendefekte wie wei\u00dfe Flecken, schwarze Flecken, Wasserflecken und Blasen sind vielf\u00e4ltig und weisen keine unterscheidbaren oder standardisierten Merkmale auf. Die logisch basierten Regeln und Algorithmen <a href=\"https:\/\/de.wikipedia.org\/wiki\/Automatische_optische_Inspektion\" target=\"_blank\" rel=\"noopener\">traditioneller<\/a> Systeme sind unzureichend f\u00fcr eine effektive Inspektion eines gesamten Wafers.<\/p>\n<\/div><\/div><\/div>\n\n\n\n<div class=\"wp-block-greenshift-blocks-titlebox gspb_titleBox gspb_titleBox-id-gsbp-0deb1d81-48a5\" id=\"gspb_titleBox-id-gsbp-0deb1d81-48a5\"><div class=\"gs-titlebox\"><div class=\"gs-title-inbox\"><div class=\"gs-titlebox-icon\"><\/div><div class=\"gs-title-inbox-label\"><\/div><\/div><div class=\"gs-titlebox-text\">\n<h2 class=\"wp-block-heading eplus-wrapper\" id=\"ki-gestutzte-fehlererkennung\"><strong>KI-gest\u00fctzte Fehlererkennung<\/strong><\/h2>\n\n\n\n<p class=\"eplus-wrapper wp-block-paragraph\">Durch die Verwendung des Segmentierungswerkzeugs von <a href=\"https:\/\/solomon-3d.mesvr.tw\/de\/products\/solvision\/\">SolVision<\/a> k\u00f6nnen winzige Defekte wie feine Kratzer in Musterbildern lokalisiert und markiert werden, um das KI-Modell zu trainieren. Selbst in komplexen oder unruhigen Hintergr\u00fcnden macht SolVision diese obskuren Produktionsfehler und deren Merkmale sichtbar und kann schnell deren Standort und Gr\u00f6\u00dfe f\u00fcr verbesserte Inspektionen identifizieren.<\/p>\n<\/div><\/div><\/div>\n\n\n\n<p class=\"eplus-wrapper wp-block-paragraph\"><\/p>\n\n\n\n<div class=\"wp-block-group eplus-wrapper\"><div class=\"wp-block-group__inner-container is-layout-flow wp-block-group-is-layout-flow\">\n<h2 class=\"wp-block-heading has-text-align-center has-black-color has-text-color eplus-wrapper\" id=\"ki-inspektion\"><strong><strong><strong><strong>KI-Inspektion<\/strong><\/strong><\/strong><\/strong><\/h2>\n\n\n\n<p class=\"has-text-align-center eplus-wrapper wp-block-paragraph\"><strong>Kratzer auf der Oberfl\u00e4che<\/strong><\/p>\n\n\n\n<div class=\"wp-block-columns eplus-wrapper is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column eplus-wrapper is-layout-flow wp-block-column-is-layout-flow\">\n<p class=\"has-text-align-center eplus-wrapper wp-block-paragraph\"><\/p>\n\n\n\n<figure class=\"wp-block-image size-large eplus-wrapper\"><img decoding=\"async\" src=\"\/wp-content\/uploads\/W001-600x603.jpg\" alt=\"Wafer grinding defect detection case\" title=\"\"><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-block-column eplus-wrapper is-layout-flow wp-block-column-is-layout-flow\">\n<p class=\"has-text-align-center eplus-wrapper wp-block-paragraph\"><\/p>\n\n\n\n<figure class=\"wp-block-image size-large eplus-wrapper\"><img decoding=\"async\" src=\"\/wp-content\/uploads\/W002-600x603.jpg\" alt=\"Wafer grinding defect detection case\" title=\"\"><\/figure>\n<\/div>\n<\/div>\n<\/div><\/div>","protected":false},"excerpt":{"rendered":"<p>Durch die Verwendung von SolVision&#8217;s KI-Inspektionsl\u00f6sung k\u00f6nnen winzige Defekte wie feine Kratzer in Musterbildern lokalisiert und markiert werden, um das KI-Modell zu trainieren.<\/p>","protected":false},"author":875,"featured_media":103877,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"_gspb_post_css":"#gspb_heading-id-gsbp-98a71402-b1a0{font-size:60px;line-height:100px;text-align:center!important;color:var(--gs-colorone);margin-top:15px;margin-bottom:15px}#gspb_heading-id-gsbp-98a71402-b1a0 .gsap-g-line{text-align:center!important}#gspb_heading-id-gsbp-98a71402-b1a0 .gspb_heading_subtitle,#gspb_subheading-id-gsbp-98a71402-b1a0{display:block;line-height:22px;margin-top:5px;font-size:30px;color:var(--wp--preset--color--white, #ffffff)}.gs-titlebox{background:#fff;line-height:24px;font-size:90%;box-shadow:0 10px 10px #00000007;margin-bottom:25px}.gs-titlebox-text>p{margin-bottom:20px!important;margin-top:0}.gs-titlebox-text>p:last-of-type{margin-bottom:0!important}#gspb_titleBox-id-gsbp-0deb1d81-48a5 .gs-titlebox .gs-title-inbox,#gspb_titleBox-id-gsbp-d7f236a4-825c 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.gs-titlebox-text{padding:20px}","footnotes":""},"categories":[3349,3364,3378,3372,3370],"tags":[],"class_list":["post-88948","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-anwenderberichte","category-fehlererkennung","category-semiconductors","category-qualitaetspruefung","category-solvision"],"acf":[],"lang":"de","translations":{"de":88948,"en":32262,"es":81727,"tw":32449,"zh":56879,"jp":78541,"pt":86937,"fr":89607,"tr":91059,"vi":92054,"th":96762,"it":98156,"ko":95145},"_links":{"self":[{"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/posts\/88948","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/users\/875"}],"replies":[{"embeddable":true,"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/comments?post=88948"}],"version-history":[{"count":0,"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/posts\/88948\/revisions"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/media\/103877"}],"wp:attachment":[{"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/media?parent=88948"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/categories?post=88948"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/solomon-3d.mesvr.tw\/de\/wp-json\/wp\/v2\/tags?post=88948"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}